RPS AX7695 远程等离子体源

集成长途等离子体源提供半导体晶圆加工所需的反响气体。AX7695集成了一个石英真空室，射频电源和一切必要的操控到一个紧凑的，独立的单元，方便直接安装在工具加工室的一个极其清洁的低成本的原子自由基源，带来所需的反响在晶圆上，在较低的复杂性水平。
RPS AX7695长途等离子体源是一种高级的设备，用于发生和操控等离子体。等离子体是一种由离子、电子和中性粒子组成的电离气体，它在许多工业和科学使用中发挥着重要作用。RPS AX7695长途等离子体源的具体特性和使用或许因制造商和具体配置而有所不同，但一般来说，这种设备或许具有以下特点:
1.高效性:它或许能够发生高密度的等离子体，然后提供高效的处理能力。
2.长途操作:该设备或许规划为长途操作，这意味着操作员能够在安全间隔外操控等离子体的发生和使用，然后提高安全性和

An integrated long distance plasma source provides the reverberating gases required for semiconductor wafer processing. The AX7695 integrates a quartz vacuum chamber, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly in the tooling chamber with an extremely clean, low-cost atom free radical source that brings the desired response on the wafer at a lower level of complexity.

The RPS AX7695 Long Distance Plasma Source is an advanced device for generating and manipulating plasma. Plasma is an ionized gas composed of ions, electrons, and neutral particles that plays an important role in many industrial and scientific uses. The specific characteristics and use of the RPS AX7695 long distance plasma source may vary by manufacturer and specific configuration, but in general, the device may have the following characteristics:

1. High efficiency: It may be able to generate high density plasma, and then provide efficient processing power.

2. Long distance operation: The device may be planned for long distance operation, which means that the operator can control the generation and use of plasma outside of a safe interval, and then improve safety and safety